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  • CVD六方氮化硼薄膜(銅基)

    單層、少層、多層等需求定制; 尺寸:10*5cm 基底:銅基

    更新時(shí)間:2024-06-03
    產(chǎn)品價(jià)格:3200
    廠商性質(zhì):生產(chǎn)廠家
    訪問次數(shù):1219
  • 基于銅基的多層氮化硼薄膜(5*2.5cm)

    Specifications: Close to complete coverage (90-95%), with some minor holes Average Thickness of BN film is 13 nm Thickness of the copper foil is 20 microns Quality is confirmed by TEM. TEM shows p

    更新時(shí)間:2024-06-03
    產(chǎn)品價(jià)格:4119.38
    廠商性質(zhì):生產(chǎn)廠家
    訪問次數(shù):1116
  • 285nm二氧化硅基底的單層氮化硼薄膜

    Single Layer CVD hexagonal Boron Nitride Film on 285 nm SiO2/Si substrates (p-doped), 1cmx1cm: 8 pack Properties of BN film 97% coverage with minor holes and organic residues High Crystalline Quali

    更新時(shí)間:2024-06-03
    產(chǎn)品價(jià)格:8093.75
    廠商性質(zhì):生產(chǎn)廠家
    訪問次數(shù):1176
  • 基于銅基的單層氮化硼薄膜(5*2.5cm)

    Single layer h-BN (Boron Nitride) film grown in copper foil. h-BN is an insulator with a direct band gap of 5.97 eV. Due to its strong covalent sp2 bonds in the plane, the in-plane mechanical strengt

    更新時(shí)間:2024-06-03
    產(chǎn)品價(jià)格:5501.75
    廠商性質(zhì):生產(chǎn)廠家
    訪問次數(shù):1150
  • 基于285nm二氧化硅基底的單層氮化硼薄膜

    Single Layer CVD hexagonal Boron Nitride Film on 285 nm SiO2/Si substrates (p-doped), 1cmx1cm: 4 pack Properties of BN film 97% coverage with minor holes and organic residues High Crystalline Quali

    更新時(shí)間:2024-06-03
    產(chǎn)品價(jià)格:4119.38
    廠商性質(zhì):生產(chǎn)廠家
    訪問次數(shù):1231
  • h-BN 氮化硼晶體

    Our h-BN crystals reach at most to 2mm in size and are considered as gold standard in 2D materials field. h-BN flakes are produced defect free which is the only commercial h-BN flake used as 2D

    更新時(shí)間:2024-06-03
    產(chǎn)品價(jià)格:5822.05
    廠商性質(zhì):生產(chǎn)廠家
    訪問次數(shù):1447
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